Influence of nitrogenizing and Al-doping on microstructures and thermoelectric properties of iron disilicide materials

Intermetallics

Volumn 13, Issue 7, 2005, Pages 704-709

  Chen, H Y ^a   Zhao, X B ^a   Zhu, T J ^a   Lu, Y F ^a   Ni, H L ^a   Muller E ^b   Mrotzek, A ^b  

^a ZHEJIANG UNIVERSITY   (China)

^b GERMAN AEROSPACE CENTER DLR   (Germany)

Author keywords

A. Silicides; B. Thermoelectric properties; C. Rapid solidification processing; Various

Indexed keywords

ALUMINUM; HOT PRESSING; MICROSTRUCTURE; OXIDATION; PHONONS; RAPID SOLIDIFICATION; SEMICONDUCTOR DOPING; SEMICONDUCTOR MATERIALS; THERMOELECTRICITY;

OPTOELECTRONIC TECHNOLOGY; PHONON SCATTERING; RAPID SOLIDIFICATION PROCESSING; THERMOELECTRIC PROPERTIES;

IRON COMPOUNDS;

EID: 15944363440     PISSN: 09669795     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.intermet.2004.12.019     Document Type: Article

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