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Journal of Crystal Growth

Volumn 275, Issue 1-2, 2005, Pages

Drift-induced step instabilities due to the gap in the diffusion coefficient

(3) Sato, Masahide a Uwaha, Makio b Saito, Yukio c

a KANAZAWA UNIVERSITY (Japan)

b NAGOYA UNIVERSITY (Japan)

c KEIO UNIVERSITY (Japan)

Author keywords

A1. Computer simulation; A1. Morphological stability; B2. Semiconducting silicon

Indexed keywords

ANISOTROPY; COMPUTER SIMULATION; ELECTRIC CURRENTS; EVAPORATION; MONTE CARLO METHODS; SEMICONDUCTING SILICON; SOLIDIFICATION; SUPERCONDUCTING TRANSITION TEMPERATURE; VECTORS;

DIFFUSION COEFFICIENTS; MORPHOLOGICAL STABILITY; STABILITY ANALYSIS; STRUCTURAL TRANSITION TEMPERATURE;

DIFFUSION;

EID: 15844375496 PISSN: 00220248 EISSN: None Source Type: Journal
DOI: 10.1016/j.jcrysgro.2004.11.060 Document Type: Conference Paper

Times cited : (4)

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