Spatial heterodyne interferometry techniques and applications in semiconductor wafer manufacturing

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5531, Issue , 2004, Pages 289-298

  Bingham, Philip R ^a   Tobin, Kenneth W ^a   Hanson, Gregory R ^a   Simpson, John T ^a  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

Author keywords

Mask Inspection; Mask Metrology; Photolithography; Spatial Heterodyne Interferometry; Wafer Inspection

Indexed keywords

MASK INSPECTION; MASK METROLOGY; SEMICONDUCTOR INDUSTRY; SPATIAL HETERODYNE INTERFEROMETRY (SHI); SPATIAL HETERODYNING; WAFER INSPECTION;

ALGORITHMS; HETERODYNING; IMAGE ANALYSIS; IMAGING TECHNIQUES; MASKS; MICROELECTROMECHANICAL DEVICES; OPTICAL SENSORS; PHASE SHIFT; PHOTOLITHOGRAPHY; SEMICONDUCTOR DEVICES; SILICON WAFERS; WAVEFRONTS;

INTERFEROMETRY;

EID: 15744396753     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.560423     Document Type: Conference Paper

References (8)

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