Arf (193 nm) alternating aperture PSM quartz defect repair and printability for 100 nm node

Proceedings of SPIE-The International Society for Optical Engineering

Volumn 4562 II, Issue , 2001, Pages 786-797

  Lalovic, Ivan ^a   Kroyan, Armen ^a   Zambon, Paolo ^a   Silsby, Christopher ^b   Farrar, Nigel ^a  

^a CYMER INC   (United States)

^b AGILENT TECHNOLOGIES   (United States)

Author keywords

193 nm Alternating PSM; 193 nm lithography; Printability; Repair

Indexed keywords

ATOMIC FORCE MICROSCOPY; DEFECTS; LITHOGRAPHY; MICROMACHINING; PHASE SHIFT; QUARTZ; SCANNING ELECTRON MICROSCOPY;

ALTERNATING APERTURE PHASE SHIFT MASKS (AAPSM);

MASKS;

EID: 18644364925     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.458362     Document Type: Article

References (4)

1. Edita Tejnil, et. al., "Evaluation of printability and inspection of phase defects on hidden-shifter alternating phase shift masks," Proc. SPIE 4066 (2000).
2. Jerry X. Chen, et.al., "Universal inspection standard for evaluation of inspection system and algorithm sensitivity and runability", Proc. SPIE 4066 (Photomask Japan 2000), 327-337.
3. UIS, Verimask, and Verithoro are trademarks of DuPont Photomasks, Inc.
4. Jerry X. Chen, et.al., "Evaluation of a multiple beam defect inspection platform using an integrated reference mask", Proc. SPIE 4186 (BACUS 2000), 630-637.