Minimizing the Effects of Hardware Marginality on Charging Damage during Plasma-Enhanced Chemical Vapor Dielectric Deposition

Journal of the Electrochemical Society

Volumn 148, Issue 12, 2001, Pages

  Cacciato, Antonio ^a  

^a NXP SEMICONDUCTORS   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 1542652186     PISSN: 00134651     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1414289     Document Type: Article

References (18)

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