CAD Design of Mask Compensation Patterns

Proceedings of IEEE Sensors

Volumn 2, Issue 1, 2003, Pages 517-522

  Teller, C ^a  

^a Centre National de la Recherche Scientifique   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANISOTROPY; BIOMEDICAL ENGINEERING; COMPUTER SIMULATION; COMPUTER SOFTWARE; CRYSTALS; ETCHING; MASKS; MICROMACHINING; PATTERN RECOGNITION; SILICON;

MASK COMPENSATION PATTERNS;

COMPUTER AIDED DESIGN;

EID: 1542544601     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (11)

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