Carbon nanotubes growth by HFCVD: Effect of the process parameters and catalyst preparation

Diamond and Related Materials

Volumn 13, Issue 2, 2004, Pages 305-310

  Dikonimos Makris, Th ^a   Giorgi, R ^a   Lisi, N ^a   Pilloni, L ^a   Salernitano, E ^a   Sarto, F ^a   Alvisi, M ^b  

^a ENEA C R CASACCIA   (Italy)

^b Centro Ricerche Brindisi   (Italy)

Author keywords

Carbon nanotubes; Chemical vapour deposition; HFCVD; Ni catalyst

Indexed keywords

CATALYSTS; CHEMICAL VAPOR DEPOSITION; CRYSTAL GROWTH; METHANE; NICKEL; SILICA; SPUTTERING; SUBSTRATES;

HOT FILAMENT CHEMICAL VAPOR DEPOSITION (HFCVD);

CARBON NANOTUBES;

DIAMOND;

EID: 1542378065     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2003.10.013     Document Type: Article

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