Silicon Micromechanical Structures Fabricated by Electrochemical Process

Proceedings of IEEE Sensors

Volumn 1, Issue 1, 2002, Pages 575-579

  Dantas, Michel O S ^a   Galeazzo, Elisabete ^a   Peres, Henrique E M ^a   Fernandez, Francisco Javier R ^a  

^a UNIVERSITY OF SÃO PAULO   (Brazil)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; CRYSTALLOGRAPHY; ETCHING; ION IMPLANTATION; LITHOGRAPHY; MASKS; MICROELECTROMECHANICAL DEVICES; MICROMACHINING; MICROSTRUCTURE; OPTOELECTRONIC DEVICES; SCANNING ELECTRON MICROSCOPY; THIN FILM CIRCUITS;

ANODIZATION TIME; SACRIFICIAL LAYERS;

POROUS SILICON;

EID: 1542331630     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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