An Application of Passive Voltage Contrast (PVC) to Failure Analysis of CMOS LSIs Using Secondary Electron Collection

Conference Proceedings from the International Symposium for Testing and Failure Analysis

Volumn , Issue , 1999, Pages 239-244

  Nishikawa, Akira ^a   Kato, Naoko I ^a   Kohno, Yoshiteru ^a   Miura, Nobuhito ^a   Shimizu, Masao ^b  

^a ITES Co Ltd   (Japan)

^b IBM JAPAN LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BACKSCATTERING; ELECTRON BEAMS; FAILURE ANALYSIS; LSI CIRCUITS; SCANNING ELECTRON MICROSCOPY; SEMICONDUCTOR DIODES; TRANSMISSION ELECTRON MICROSCOPY;

ABSORPTION CURRENTS; PASSIVE VOLTAGE CONTRAST (PVC);

CMOS INTEGRATED CIRCUITS;

EID: 1542300926     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

1. Thomas W. Lee and Dr. Seshu. Pabbisetty, Microelectronic Failure Analysis: Desk Reference 3rd editon, p 163, ASM International, Material Park, Ohio (1993)
2. Nishikawa, N. I. Kato, J. Matsuzawa, K. Takagi, N. Miura: Proc. of 24th ISTFA, pp 157-162 (1998)
3. V. Liang, H. Sur, S. Bothra: Proc. of 24th ISTFA, pp 221-225 (1998)
4. H. Sur, S. Bothra, R. Lei, J. Hahn, H. J. Brugge: Proc. of 24th ISTFA, pp 273-278 (1998)
5. H. Lorenz, C. Engel: Proc. of 24th ISTFA, pp 289-295 (1998)