메뉴 건너뛰기




Volumn 1, Issue , 2002, Pages 335-338

Planar Schottky diodes with low barrier height for microwave detector application

Author keywords

[No Author keywords available]

Indexed keywords

METALLORGANIC CHEMICAL VAPOR DEPOSITION; MICROELECTRONICS; SCHOTTKY BARRIER DIODES; SEMICONDUCTOR DOPING; SEMICONDUCTOR METAL BOUNDARIES;

EID: 1542275014     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/MIEL.2002.1003205     Document Type: Conference Paper
Times cited : (8)

References (7)
  • 1
    • 0003414925 scopus 로고    scopus 로고
    • Control of the effective barrier heidht in al/n-gaas epitaxial structures fabricated in a single mocvd process
    • V.I.Shashkin, A.V.Murel, Yu.N.Drozdov, V.M.Daniltsev, and O.I.Khrykin, "Control of the Effective Barrier Heidht in Al/n-GaAs Epitaxial Structures Fabricated in a Single MOCVD Process", Russian Microelectronics, 1997, vol. 26, pp.49-52.
    • (1997) Russian Microelectronics , vol.26 , pp. 49-52
    • Shashkin, V.I.1    Murel, A.V.2    Drozdov, Y.N.3    Daniltsev, V.M.4    Khrykin, O.I.5
  • 2
    • 0033888855 scopus 로고    scopus 로고
    • Barrier height engineering on gaas thz schottky diodes by means of high-low doping, ingaas-and ingap-layers
    • S.Sassen, B.Witzigmann, C.Wolk, and H.Brugger, "Barrier Height Engineering on GaAs THz Schottky Diodes by Means of High-Low Doping, InGaAs-and InGaP-Layers", IEEE Trans. Electron Devices, 2000, vol.47, p.24-32.
    • (2000) IEEE Trans. Electron Devices , vol.47 , pp. 24-32
    • Sassen, S.1    Witzigmann, B.2    Wolk, C.3    Brugger, H.4
  • 4
    • 0000510149 scopus 로고
    • The effect of the planar doping on the electrical transport properties at the al:n-gaas(100) interface: Ultrahigh effective doping
    • J.M.Geraldo, W.N.Podrigues, G.Medeiros-Ribeiro, and A.G. de Oliveira, "The Effect of the Planar Doping on the Electrical Transport Properties at the Al:n-GaAs(100) Interface: Ultrahigh Effective Doping", J.Appl.Phys., 1993, vol. 73, pp.820-823.
    • (1993) J.Appl.Phys. , vol.73 , pp. 820-823
    • Geraldo, J.M.1    Podrigues, W.N.2    Medeiros-Ribeiro, G.3    De Oliveira, A.G.4
  • 5
    • 0035416115 scopus 로고    scopus 로고
    • Microstructure and properties of aluminum contacts formed on gaas (100) by low pressure chemical vapor deposition with dimethylethylamine alane source
    • V.Shashkin, S.Rushworth, V.Daniltsev, A.Murel, Yu.Drozdov, S.Gusev, O.Khrykin, and N.Vostokov, "Microstructure and Properties of Aluminum Contacts Formed on GaAs (100) by Low Pressure Chemical Vapor Deposition with Dimethylethylamine Alane Source" J. Electron. Mater., 2001, vol. 30, p.980-986.
    • (2001) J. Electron. Mater. , vol.30 , pp. 980-986
    • Shashkin, V.1    Rushworth, S.2    Daniltsev, V.3    Murel, A.4    Drozdov, Y.5    Gusev, S.6    Khrykin, O.7    Vostokov, N.8


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.