Properties of R.F. magnetron sputtered cadmium-tin-oxide and indium-tin-oxide thin films

Thin Solid Films

Volumn 479, Issue 1-2, 2005, Pages 223-231

  Wohlmuth, Walter ^a   Adesida, Ilesanmi ^b  

^a TRIQUINT SEMICONDUCTOR   (United States)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Cadmium tin oxide; Etching; Indium tin oxide; Schottky barrier

Indexed keywords

CARRIER CONCENTRATION; DIFFRACTION; ETCHING; HALL EFFECT; LIQUID CRYSTAL DISPLAYS; MAGNETRON SPUTTERING; OHMIC CONTACTS; PHOTODETECTORS; POLYCRYSTALLINE MATERIALS; THIN FILMS;

CADMIUM TIN OXIDE; HALL MOBILITIES; INDIUM TIN OXIDE; SCHOTTKY BARRIERS;

INDIUM COMPOUNDS;

EID: 15344343201     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.186     Document Type: Article

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