Influence of oxygen pressure, temperature and substrate/target distance on Cu2Ta4O12 thin films prepared by pulsed-laser deposition

Thin Solid Films

Volumn 479, Issue 1-2, 2005, Pages 12-16

  Heinrich, Andreas ^a   Renner, Bernd ^a   Lux, Robert ^a   Ebbinghaus, Stefan G ^a   Reller, Armin ^a   Stritzker, Bernd ^a  

^a UNIVERSITY OF AUGSBURG   (Germany)

Author keywords

Deposition of films; Dielectric materials; Laserablation; Surface structure

Indexed keywords

COPPER COMPOUNDS; DEPOSITION; DIELECTRIC MATERIALS; ENERGY DISPERSIVE SPECTROSCOPY; EXCIMER LASERS; OXYGEN; PRESSURE EFFECTS; PULSED LASER DEPOSITION; SCANNING ELECTRON MICROSCOPY; SURFACE STRUCTURE; X RAY DIFFRACTION;

DEPOSITION OF FILMS; FOURFOLD COORDINATION; LASER ENERGY; OXYGEN PRESSURE;

THIN FILMS;

EID: 15344339916     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.11.103     Document Type: Article

References (6)

1. M.A. Subramanian, D. Li, N. Duan, B.A. Reisner, and A.W. Sleight J. Solid State Chem. 151 2000 323
2. M.A. Subramanian, and A.W. Sleight Solid State Sci. 4 2002 347
3. L. Fang, and M. Shen Thins Solid Films 440 2003 60
4. Y. Lin, Y.B. Chen, T. Garret, S.W. Liu, C.L. Chen, L. Chen, R.P. Bontchev, A. Jacobson, J.C. Jiang, E.I. Meletis, J. Horwitz, and H.-D. Wu Appl. Phys. Lett. 81 4 2002 631
5. J.K.N. Lindner Nucl. Instrum. Methods, B 178 2001 44
6. N.P. Wa Ilunga Acta Chem. Scand., A Phys. Inorg. Chem. 37 1983 117