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Volumn 16, Issue 4, 2001, Pages 370-375
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In-depth profile analysis by radiofrequency glow discharge optical emission spectrometry using pressure as variable parameter
a a a a a |
Author keywords
[No Author keywords available]
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Indexed keywords
CONCENTRATION (PROCESS);
ELECTRIC POTENTIAL;
ELECTROPLATING;
EMISSION SPECTROSCOPY;
PROFILOMETRY;
RADIOFREQUENCY SPECTROSCOPY;
SPUTTERING;
STEEL;
ZINC;
OPTICAL EMISSION SPECTROSCOPY;
GLOW DISCHARGES;
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EID: 0035311508
PISSN: 02679477
EISSN: None
Source Type: Journal
DOI: 10.1039/b010059p Document Type: Article |
Times cited : (16)
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References (26)
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