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Volumn 16, Issue 4, 2001, Pages 370-375

In-depth profile analysis by radiofrequency glow discharge optical emission spectrometry using pressure as variable parameter

Author keywords

[No Author keywords available]

Indexed keywords

CONCENTRATION (PROCESS); ELECTRIC POTENTIAL; ELECTROPLATING; EMISSION SPECTROSCOPY; PROFILOMETRY; RADIOFREQUENCY SPECTROSCOPY; SPUTTERING; STEEL; ZINC;

EID: 0035311508     PISSN: 02679477     EISSN: None     Source Type: Journal    
DOI: 10.1039/b010059p     Document Type: Article
Times cited : (16)

References (26)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.