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Volumn 14, Issue 1, 2005, Pages

The history and potential of maskless e-beam lithography

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON DEVICES; ELECTRONICS INDUSTRY; ELECTROOPTICAL DEVICES; HISTORY; SEMICONDUCTOR DEVICE MANUFACTURE; TECHNOLOGY;

EID: 15044338702     PISSN: 1074407X     EISSN: None     Source Type: Trade Journal    
DOI: None     Document Type: Article
Times cited : (7)

References (14)
  • 2
    • 0018456222 scopus 로고
    • "Recent Advances in Electron Beam Lithography for High-volume Production of VLSI Devices"
    • H.C. Pfeiffer "Recent Advances in Electron Beam Lithography for High-volume Production of VLSI Devices," IEEE Trans. on Electron Devices, ED-26, No. 4, p. 663, 1979.
    • (1979) IEEE Trans. on Electron Devices , vol.ED-26 , Issue.4 , pp. 663
    • Pfeiffer, H.C.1
  • 3
    • 0017552619 scopus 로고
    • "Scanning Electron Beam System Turns out Wafers Fast"
    • E.V. Weber, H.S. Yourke, "Scanning Electron Beam System Turns out Wafers Fast," Electronics 50, p. 96, 1977.
    • (1977) Electronics , vol.50 , pp. 96
    • Weber, E.V.1    Yourke, H.S.2
  • 5
    • 0021497341 scopus 로고
    • "Direct Write Electron Beam Lithography - A Production Line Reality"
    • Sept
    • H.C. Pfeiffer, "Direct Write Electron Beam Lithography - A Production Line Reality," Solid State Technology, p. 223, Sept. 1984.
    • (1984) Solid State Technology , pp. 223
    • Pfeiffer, H.C.1
  • 7
    • 0026912455 scopus 로고
    • "Advancing the State of the Art in High-performance Logic and Array Technology"
    • K.H. Brown, D.A. Grose, R. C. Lange, T.H. Ning, P.A. Totta, "Advancing the State of the Art in High- performance Logic and Array Technology," IBM J. Res. Develop. 36, No. 3, p. 821, 1992.
    • (1992) IBM J. Res. Develop. , vol.36 , Issue.3 , pp. 821
    • Brown, K.H.1    Grose, D.A.2    Lange, R.C.3    Ning, T.H.4    Totta, P.A.5
  • 8
    • 15044365794 scopus 로고    scopus 로고
    • "65 nm Device Manufacture Using Shaped E-beam Lithography"
    • Intl. Conf. on Micro- and Nano-Engineering to be published in Micro-electronic Engineering
    • L. Pain, M. Jurdit, Y. Laplanche, J. Todeschini, H. Leininger, et al., "65 nm Device Manufacture Using Shaped E-beam Lithography," Intl. Conf. on Micro- and Nano-Engineering 2004, to be published in Micro-electronic Engineering.
    • (2004)
    • Pain, L.1    Jurdit, M.2    Laplanche, Y.3    Todeschini, J.4    Leininger, H.5
  • 9
    • 0036381387 scopus 로고    scopus 로고
    • "Shaped E-beam Lithography Integration Work for Advanced ASIC Manufacturing"
    • L. Pain, M. Charpin, Y. Laplanche, D. Henry, "Shaped E-beam Lithography Integration Work for Advanced ASIC Manufacturing," Proc. SPIE, Vol. 4688, p. 607, 2002.
    • (2002) Proc. SPIE , vol.4688 , pp. 607
    • Pain, L.1    Charpin, M.2    Laplanche, Y.3    Henry, D.4
  • 13
    • 15044353857 scopus 로고
    • "Basic Limitations of Probe Forming Systems Due to Electron-electron Interaction"
    • H.C. Pfeiffer, "Basic Limitations of Probe Forming Systems Due to Electron-electron Interaction,"Proc. 5th Ann. SEM Symp. (IITRI), p. 113,1972.
    • (1972) Proc. 5th Ann. SEM Symp. (IITRI) , pp. 113
    • Pfeiffer, H.C.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.