Effect of annealing on CoSi2 thin films prepared by magnetron sputtering

Materials Science and Engineering: B

Volumn 119, Issue 1, 2005, Pages 61-64

  Cheng, Fanxiong ^a   Jiang, Chuanhai ^a   Wu, Jiansheng ^a  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

Author keywords

Annealing; CoSi2 thin films; Electrical resistivity; Thermal stability

Indexed keywords

ANNEALING; ARGON; COBALT COMPOUNDS; ELECTRIC CONDUCTIVITY; EVAPORATION; MAGNETRON SPUTTERING; POINT DEFECTS; THERMODYNAMIC STABILITY; X RAY DIFFRACTION ANALYSIS;

CO-DEPOSITION; COSI2 THIN FILMS; SOLID REACTIONS; SOLID STATE REACTION;

THIN FILMS;

EID: 14944379096     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2005.01.006     Document Type: Article

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