Naphthenic acid-derived nanocrystalline ZnO films on silica substrate

Journal of Sol-Gel Science and Technology

Volumn 33, Issue 2, 2005, Pages 215-219

  Hwang, Kyu Seog ^a   Jeon, Young Sun ^a   An, Jun Hyung ^b   Kim, Byung Hoon ^b  

^a Nambu University   (South Korea)

^b Chonnam National University   (South Korea)

Author keywords

Naphthenic acid; Silica glass; ZnO

Indexed keywords

ABSORPTION; ACOUSTIC WAVES; DEPOSITION; FUSED SILICA; HEAT TREATMENT; NANOSTRUCTURED MATERIALS; OPACITY; SILICA; SOL-GELS; SPECTROPHOTOMETERS; SURFACE WAVES; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

CHEMICAL SOLUTION DEPOSITION (CSD); NAPHTHENIC ACID; SURFACE ACOUSTIC WAVES (SAW); ZNO;

ZINC OXIDE;

EID: 14844349306     PISSN: 09280707     EISSN: None     Source Type: Journal    
DOI: 10.1007/s10971-005-5616-3     Document Type: Article

References (20)

1. K. Matsubara, P. Fons, A. Yamada, M. Watanabe, and S. Niki, Thin Solids Films 347, 238 (1999).
2. S. Zhu, C. Su, S. Lehoczky, M. George, and D. Lowndes, J. Mater. Res. 15(5), 1125 (2000).
3. M. Chen, Z. Pei, X. Wang, C. Sun, and L. Wen, J. Mater. Res. 16(7), 2118 (2001).
4. K. Ellmer, F. Kudella, R. Mientus, R. Schieck, and S. Fiechter, Thin Solids Film 247, 15 (1994).
5. Y. Chen, S. Hong, H. Ko, M. Nakajima, T. Yao, and Y. Segawa, Appl. Phys. Lett. 76(2), 245 (2000).
6. A. Ohtomo, K. Tamura, K. Saikusa, K. Takahashi, T. Makino, Y. Segawa, H. Koinuma, and M. Kawasaki, Appl. Phys. Lett. 75(17), 2635 (1999).
7. P. Nunes, B. Fernandes, E. Fortunato, P. Vilarinho, and R. Martins, Thin Solids Film 337, 176 (1999).
8. K. Hwang and Y. Park, J. Mater. Res. 16(9), 2519 (2001).
9. K. Hwang, Y. Yun, Y. Kim, H. Ryu, and B. Kang, Jpn. J. Appl. Phys. 41, 795 (2002).
10. K. Hwang, Y. Yun, B. Kang, S. Kim, S. Jang, C. Kim, and J. Oh, J. Mater. Sci.: Mater. in Med. 14, 761 (2003).
11. K. Hwang, T. Manabe, I. Yamaguchi, T. Kumagai, and S. Mizuta, Jpn. J. Appl. Phys. 36, 5221 (1997).
12. A. Jiménez-González, J. Soto Urueta, and R. Suárez-Parra, J. Crys. Growth 192, 430 (1998).
13. D. Shimono, S. Tanaka, T. Torikai, T. Watari, and M. Murano, J. Ceram. Proc. Res. 2(4), 184 (2001).
14. M. Ohyama, H. Kozuka, and T. Yoko, Thin Solids Film 306, 78 (1997).
15. Y. Ohya, H. Saiki, and Y. Takahashi, J. Mater. Sci. 29, 4099 (1994).
16. B. Wessler, F.F. Lange, and W. Mader, J. Mater. Res. 17(7), 1644 (2002).
17. J. Fukushima, K. Kodaira, A. Tsunashima, and T. Matsushita, Yogyo-Kyokai-Shi 83(11), 535 (1975).
18. R. Cebulla, R. Wendt, and K. Ellmer, J. Appl. Phys. 83, 1087 (1998).
19. K. Park, D. Ma, and K. Kim, Thin Solid Films 305, 201 (1997).
20. E. Ziegler, A. Heinrich, H. Oppermann, and G. Stover, Phys. Status Solidi A66, 635 (1981).