Layer uniformity of glancing angle deposition

Vacuum

Volumn 78, Issue 1, 2005, Pages 107-111

  Wang, Jianguo ^a   Shao, Jianda ^a   Yi, Kui ^a   Fan, Zhengxiu ^a  

^a SHANGHAI INSTITUTE OF OPTICS AND FINE MECHANICS   (China)

Author keywords

E beam evaporation; Glancing angle deposition; Layer uniformity

Indexed keywords

DEPOSITION; ELECTRON BEAMS; EVAPORATION; MONOLAYERS; NANOSTRUCTURED MATERIALS; OPTICAL DEVICES; PARAMETER ESTIMATION; ZIRCONIA;

E-BEAM EVAPORATION; GLANCING ANGLE DEPOSITION (GLAD); LAYER THICKNESS; LAYER UNIFORMITY;

THICKNESS MEASUREMENT;

EID: 14644388838     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2004.12.019     Document Type: Article

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