Uniformity improvement in dc magnetron sputtering deposition on a large area substrate

Vacuum

Volumn 51, Issue 4, 1998, Pages 791-793

  Seino, T ^a   Kawakubo, Y ^a   Nakajima, K ^a   Kamei, M ^a  

^a HITACHI LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANODES; ELECTRONS; LIQUID CRYSTAL DISPLAYS; PLASMA DENSITY; SPUTTER DEPOSITION; SUBSTRATES;

ELECTRON SUPPRESSERS;

MAGNETRON SPUTTERING;

EID: 0032319993     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/s0042-207x(98)00292-9     Document Type: Article

References (5)

1. Latz, R., Michael, K. and Scherer, M., Jpn. J. Appl. Phys., 1991, 30(2A), 149.
2. Hosokawa, N., Thin Solid Films, 1996, 281-282, 136.
3. Chapman, B.N., Glow Discharge Processes. John Wiley & Sons, Inc., New York, 1980, p. 248.
4. Spencer, A. G., Bishop, C. A. and Howson, R. P., Vacuum, 1987, 37(3/4), 363.
5. Rossnagel, S.M., Cuomo, J.J. and Westwood, W.D., in Handbook of plasma processing technology. NOYES PUBLICATIONS, New Jersey, 1990, p. 30.