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Journal of Non-Crystalline Solids

Volumn 198-200, Issue PART 2, 1996, Pages 1029-1033

Real time observations of surface reactions during a-Si:H deposition or H2 plasma annealing by using FT-IR-ATR

(4) Miyoshi, Y a Yoshida, Y a Miyazaki, S a Hirose, M a

a HIROSHIMA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; CHEMICAL VAPOR DEPOSITION; DATA ACQUISITION; FOURIER TRANSFORM INFRARED SPECTROSCOPY; HYDRIDES; HYDROGEN; HYDROGEN BONDS; HYDROGENATION; PLASMA APPLICATIONS; SURFACE PHENOMENA;

FOURIER TRANSFORM INFRARED ATTENUATED TOTAL REFLECTION; HYDROGEN PLASMA ANNEALING;

AMORPHOUS SILICON;

EID: 17344380781 PISSN: 00223093 EISSN: None Source Type: Journal
DOI: 10.1016/0022-3093(96)00032-4 Document Type: Article

Times cited : (25)

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