Characterisation of thin amorphous silicon films with multiple internal reflectance spectroscopy

Journal of Non-Crystalline Solids

Volumn 198-200, Issue PART 1, 1996, Pages 69-72

  Fameli, G ^a   Della Sala, D ^a   Roca, F ^a   Gerardi, C ^b  

^a ENEA CR Portici   (Italy)

^b Centro Nazionale per la Ricerca e lo Sviluppo dei Materiali   (Italy)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; BONDING; CHARACTERIZATION; CHEMICAL VAPOR DEPOSITION; FILM GROWTH; HYDROGEN BONDS; INFRARED SPECTROSCOPY; PLASMA APPLICATIONS; REFLECTION; SUBSTRATES;

CRYSTALLINE SILICON; FILM GROWTH MECHANISM; INFRARED MULTIPLE INTERNAL REFLECTANCE SPECTROSCOPY; STRETCHING BANDS; THIN AMORPHOUS SILICON FILMS;

AMORPHOUS FILMS;

EID: 0030563545     PISSN: 00223093     EISSN: None     Source Type: Journal    
DOI: 10.1016/0022-3093(95)00660-5     Document Type: Article

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