Correlation between chemical shift of Si Kα lines and the effective charge on the Si atom and its application in the Fe-Si binary system

Physical Review B - Condensed Matter and Materials Physics

Volumn 69, Issue 3, 2004, Pages

  Liu, Zhenlin ^a   Sugata, Shouichi ^a   Yuge, Koretaka ^a   Nagasono, Mitsuru ^a   Tanaka, Koki ^b   Kawai, Jun ^a  

^a KYOTO UNIVERSITY   (Japan)

^b NIPPON STEEL CORPORATION   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

BORON; CARBON; DISODIUM SILICOHEXAFLUORIDE; IRON DERIVATIVE; SILICON DERIVATIVE; SILICON NITRIDE; STEEL; UNCLASSIFIED DRUG;

ARTICLE; ATOM; CALCULATION; ELECTRON; X RAY FLUORESCENCE;

EID: 1442263801     PISSN: 10980121     EISSN: 1550235X     Source Type: Journal    
DOI: 10.1103/PhysRevB.69.035106     Document Type: Article

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