Free carrier diffusion in 4H-SiC

Materials Science Forum

Volumn 353-356, Issue , 2001, Pages 353-356

  Grivickas, P ^a   Martinez, A ^a   Mikulskas, I ^b   Grivickas, V ^b   Tomasiunas R ^b   Linnros, J ^a   Lindefelt, U ^a,c  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b VILNIUS UNIVERSITY   (Lithuania)

^c ABB CORPORATE RESEARCH   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION; CHARGE CARRIERS; CHEMICAL VAPOR DEPOSITION; DIFFRACTION GRATINGS; DIFFUSION IN SOLIDS; ENERGY GAP; HOLOGRAPHY; NUMERICAL ANALYSIS; REDUCTION; REFRACTIVE INDEX;

AMBIPOLAR DIFFUSIVITY; BAND GAP NARROWING; DEGENERATED STATISTICS; FREE CARRIERS; TRANSIENT GRATINGS TECHNIQUE;

SILICON CARBIDE;

EID: 14344268421     PISSN: 02555476     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.4028/www.scientific.net/msf.353-356.353     Document Type: Article

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