Single-stage plasma-chemical process for particulates, NO x, and SO x simultaneous removal

IEEE Transactions on Industry Applications

Volumn 38, Issue 5, 2002, Pages 1204-1209

  Kuroki, Tomoyuki ^a,b   Takahashi, Masayoshi ^b   Okubo, Masaaki ^a,b   Yamamoto, Toshiaki ^a,b  

^a IEEE   (Japan)

^b Osaka Prefecture University   (Japan)

Author keywords

Chemical reaction; Exhaust gas treatment; Hybrid system; NO x; Nonthermal plasma; Particulate removal; Plasma; Pollutants; SO x

Indexed keywords

GAS REMOVAL;

CHEMICAL REACTORS; NITROGEN OXIDES; PARTICULATE EMISSIONS; PLASMA DEVICES; SOLUTIONS; SURFACE REACTIONS;

GAS EMISSIONS;

EID: 0036755161     PISSN: 00939994     EISSN: None     Source Type: Journal    
DOI: 10.1109/TIA.2002.802919     Document Type: Article

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