CF4 decomposition of flue gas from semiconductor process using inductively coupled plasma

Conference Record - IAS Annual Meeting (IEEE Industry Applications Society)

Volumn 3, Issue , 2002, Pages 1810-1815

  Kuroki, T ^a   Mine, J ^a   Odahara, S ^a   Okubo, M ^a   Yamamoto, T ^a   Saeki, N ^b  

^a Osaka Prefecture University   (Japan)

^b Pearl Kogyo Co Ltd   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CHEMICAL REACTORS; CHEMICAL VAPOR DEPOSITION; DECOMPOSITION; FLUOROCARBONS; GLOBAL WARMING; INDUCTIVELY COUPLED PLASMA; SEMICONDUCTOR DEVICE MANUFACTURE; STOICHIOMETRY;

PER-FLUORINATED COMPOUNDS;

FLUE GASES;

EID: 0036443220     PISSN: 01972618     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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