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Thin Solid Films

Volumn 396, Issue 1-2, 2001, Pages 5-8

Thermal stability of xerogel films

(7) Kumar, A a Bakhru, H a Fortin, J B b Yang, G R b Lu, T M b Jin, C c Lee, W W c

a STATE UNIVERSITY OF NEW YORK (United States)

b RENSSELAER POLYTECHNIC INSTITUTE (United States)

c TEXAS INSTRUMENTS (United States)

Author keywords

Dielectrics; Nuclear reaction analysis (NRA); Silicon oxide; Thermal desorption

Indexed keywords

ADSORPTION; DIELECTRIC MATERIALS; ION BEAMS; SILICA; SURFACE TREATMENT; THERMODYNAMIC STABILITY;

THERMAL DESORPTION SPECTROSCOPY (TDS); XEROGEL FILMS;

THIN FILMS;

EID: 0035928993 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/S0040-6090(01)01161-0 Document Type: Letter

Times cited : (12)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.