Oriented and non-oriented HfO2-Y2O3 films on amorphous quartz glass substrates prepared by sol-gel processes

Japanese Journal of Applied Physics, Part 2: Letters

Volumn 39, Issue 3 A/B, 2000, Pages

  Nishide, Toshikazu ^a   Honda, Shinji ^a   Matsuura, Masaharu ^b   Ito, Yoshiaki ^c   Takase, Tsugiko ^c  

^a NIHON UNIVERSITY   (Japan)

^b NISSAN ARC LTD   (Japan)

^c Fukushima Technology Center   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALLIZATION; ELECTRIC FURNACES; GLASS; HAFNIUM COMPOUNDS; QUARTZ; SOL-GELS; TEMPERATURE; THICKNESS MEASUREMENT; TRANSMISSION ELECTRON MICROSCOPY; X RAY DIFFRACTION; YTTRIUM COMPOUNDS;

AMORPHOUS QUARTZ GLASS SUBSTRATES; NON ORIENTED FILMS; ORIENTED CRYSTALS; ORIENTED FILMS;

METALLIC FILMS;

EID: 0033734138     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/jjap.39.l237     Document Type: Article

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