The feasibility of inert colloidal processing of silicon nanoparticles

Journal of Colloid and Interface Science

Volumn 283, Issue 2, 2005, Pages 414-421

  Ostraat, Michele L ^a,c   Atwater, Harry A ^b   Flagan, Richard C ^a  

^a California Institute of Technology   (United States)

^b California Institute of Technology   (United States)

^c DUPONT COMPANY   (United States)

Author keywords

Aerosol; Colloid; Colloid stability; Nanoparticle; Nanoparticle reactivity; Passivation; Silicon; TEOS

Indexed keywords

AEROSOLS; COLLOIDS; ETHANOL; NANOSTRUCTURED MATERIALS; OXIDES; PARTICLE SIZE ANALYSIS; PYROLYSIS; SELF ASSEMBLY; SOLVENTS; THICKNESS CONTROL;

AEROSOL PHASE; NONVOLATILE FLOATING-GATE MEMORY DEVICES; OXIDE THICKNESS; SILICON NANOPARTICLES;

SILICON;

ALCOHOL; ETHYLENE GLYCOL; NANOPARTICLE; OXIDE; SILANE; SILICATE; SILICON; SOLVENT; TETRAORTHOSILICATE; UNCLASSIFIED DRUG; VOLATILE AGENT; WATER;

ACCURACY; AEROSOL; ANALYZER; ARTICLE; COLLOID; DEVICE; DILUTION; DISPERSION; FORCE; LIQUID; PARTICLE SIZE; PRIORITY JOURNAL; PYROLYSIS; REDUCTION; THICKNESS;

EID: 13844280374     PISSN: 00219797     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jcis.2004.09.032     Document Type: Article

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