TiN deposition and ion current distribution for trench target by plasma-based ion implantation and deposition

Surface and Coatings Technology

Volumn 193, Issue 1-3 SPEC. ISS., 2005, Pages 17-21

  Yukimura, Ken ^a   Ma, Xinxin ^b   Ikehata, Takashi ^c  

^a DOSHISHA UNIVERSITY   (Japan)

^b HARBIN INSTITUTE OF TECHNOLOGY   (China)

^c IBARAKI UNIVERSITY   (Japan)

Author keywords

Deposition; Ion sheath; Plasma based ion implantation; TiN

Indexed keywords

CATHODES; COATING TECHNIQUES; ELECTRIC DISCHARGES; ION IMPLANTATION; PLASMAS; PRESSURE EFFECTS; VOLTAGE CONTROL;

CATHODIC ARC DISCHARGES; ION CURRENT DISTRIBUTION; ION SHEATHS; PLASMA-BASED ION IMPLANTATION;

TITANIUM NITRIDE;

CATHODIC ARC PLASMA DEPOSITION;

EID: 13844271961     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2004.08.133     Document Type: Article

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