Sheath formation and ion flux distribution inside the trench in plasma-based ion implantation

Nuclear Instruments and Methods in Physics Research, Section B: Beam Interactions with Materials and Atoms

Volumn 206, Issue , 2003, Pages 772-776

  Ikehata, T ^a   Shioya, K ^a   Araki, T ^a   Sato, N Y ^a   Mase, H ^a   Yukimura, K ^b  

^a IBARAKI UNIVERSITY   (Japan)

^b DOSHISHA UNIVERSITY   (Japan)

Author keywords

Hollow cathode effect; Ion flux; Ion sheath; Plasma based ion implantation; Secondary electron emission; Three dimensional workpiece

Indexed keywords

ELECTRIC POTENTIAL; ELECTROSTATICS; ION IMPLANTATION; PLASMA APPLICATIONS;

SHEATH FORMATION;

ION BEAMS;

EID: 0038075084     PISSN: 0168583X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0168-583X(03)00846-2     Document Type: Conference Paper

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