Contact angle of water on chromium nitride thin film prepared on three-dimensional materials by chromium plasma-based ion implantation

Surface and Coatings Technology

Volumn 158-159, Issue , 2002, Pages 577-581

  Kuze, Eiji ^a   Teramoto, Tomoyuki ^a   Yukimura, Ken ^a   Maruyama, Toshiro ^b  

^a DOSHISHA UNIVERSITY   (Japan)

^b KYOTO UNIVERSITY   (Japan)

Author keywords

Contact angle; CrN; Deposition; Ion implantation; Plasma based ion implantation (PBII)

Indexed keywords

CHROMIUM COMPOUNDS; CONTACT ANGLE; ION IMPLANTATION; TRENCHING; WATER;

PULSE POTENTIAL;

THIN FILMS;

ION IMPLANTATION;

EID: 0036394358     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00311-0     Document Type: Article

References (9)