X-ray photoelectron spectroscopy study of magnetic tunnel junctions

Journal of Applied Physics

Volumn 97, Issue 3, 2005, Pages

  Lee, Hyeon Jun ^a,b   Jeong, Se Young ^a,b   Cho, Chae Ryong ^c   Lee, J H ^d   Joo, S J ^d   Shin, K H ^d   Lee, B C ^e   Kim, Tae Suk ^f   Park, J H ^g   Kang, J S ^h   Rhie, K ^d,i  

^a Pusan National University   (South Korea)

^b Advanced Material Research Laboratory   (South Korea)

^c Korea Basic Science Institute (KBSI)   (South Korea)

^d Korea Institute of Science and Technology   (South Korea)

^e Inha University   (South Korea)

^f Seoul National University   (South Korea)

^g Pohang University of Science and Technology (POSTECH)   (South Korea)

^h The Catholic University of Korea   (South Korea)

ⁱ Korea University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

MAGNATIC TUNNEL JUNCTIONS (MTJ); OVER-OXIDATION; OXIDATION TIME; OXYGEN CONCENTRATION;

DIFFUSION; INTERFACES (MATERIALS); MAGNETISM; MAGNETORESISTANCE; OXIDATION; RAPID THERMAL ANNEALING; X RAY PHOTOELECTRON SPECTROSCOPY;

TUNNEL JUNCTIONS;

EID: 13644278647     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1836853     Document Type: Article

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