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Volumn 86, Issue 4, 2005, Pages
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Control of silicidation in HfO2/Si(100) interfaces
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Author keywords
[No Author keywords available]
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Indexed keywords
INTERFACES (MATERIALS);
LASERS;
PERMITTIVITY;
PULSED LASER DEPOSITION;
SILICON;
SUBSTRATES;
X RAY PHOTOELECTRON SPECTROSCOPY;
HAFNIUM SILICIDE;
SILICIDATION;
SILICON SUBOXIDES;
HAFNIUM COMPOUNDS;
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EID: 13644273772
PISSN: 00036951
EISSN: None
Source Type: Journal
DOI: 10.1063/1.1856140 Document Type: Article |
Times cited : (45)
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References (13)
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