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Volumn 86, Issue 4, 2005, Pages

Control of silicidation in HfO2/Si(100) interfaces

Author keywords

[No Author keywords available]

Indexed keywords

INTERFACES (MATERIALS); LASERS; PERMITTIVITY; PULSED LASER DEPOSITION; SILICON; SUBSTRATES; X RAY PHOTOELECTRON SPECTROSCOPY;

EID: 13644273772     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1856140     Document Type: Article
Times cited : (45)

References (13)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.