Study of the oxidization of ns-SiN x:H thin films using FTIR phase modulated ellipsometry

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 5527, Issue , 2004, Pages 132-138

  Sancho Parramon, J ^a   Bosch, S ^a   Pinyol, A ^a   Bertran, E ^a   Canillas, A ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

Ellipsometry; Infrared spectroscopy; Nanostructured silicon nitride; Optical characterization

Indexed keywords

MECHANICAL STABILITY; OPTICAL CHARACTERIZATION; POLARIZERS; TIME EVOLUTION;

ELLIPSOMETRY; FOURIER TRANSFORM INFRARED SPECTROSCOPY; INFRARED SPECTROSCOPY; NANOSTRUCTURED MATERIALS; OXIDATION; PHASE MODULATION; SILICON NITRIDE;

THIN FILMS;

EID: 13444270817     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.557424     Document Type: Conference Paper

References (12)

1. M. Schubert, B. Rheinländer, E. Franke, H. Neuman, T. E. Tiwald, J. A. Woollam, J. Hahn, and F. Richter. "Infrared optical properties of mixed-phase thin films studied by spectroscopic ellipsometry using boron nitride as an example", Physical Review B, 56, 13306-13313, 1997.
2. T. E. Tiwald, J.A. Woollam, S. Zollner, J. Christiansen, R. B. Gregory, T. Wetteroth, S. R. Wilson, and A. R. Powell. "Carrier concentration and lattice absorption in bulk and epitaxial silicon carbide determined using infrared ellipsometry", Physical Review B, 60, 11464-11474, 1999.
3. D. Tsankov, K. Hinrichs, A. Röseler, and E. H. Korte. "FTIR ellipsometry as a tool for studying organic layers: from Langmuir-Blodgett films to can coatings" Physica Status Solidi A, 188, 1319-1329, 2001.
4. K. Vedam, P. J. McMarr, and J. Narayan. "Non-destructive depth profiling by spectroscopic ellipsometry" Applied Physics Letters. 47, 339-341, 1985.
5. W. S. Liao, C. H. Lin and S. C. Lee. "Oxidation of silicon nitride prepared by plasma-enhanced chemical vapour deposition at low temperature" Applied Physics Letters, 65, 2229-2231, 1994.
6. A. Canillas, A. Pinyol, J. Sancho-Parramon, J. Ferré-Borrull, and E. Bertran. "FTIR phase modullated ellipsometry characterization of hydrogenated amorphous silicon nitride thin films with embedded nano-particles", Thin Solid Films, 455-456, 167-171, 2004.
7. A. Canillas, E. Pacual, and B. Drévillon. "Phase-modullated ellipsometer using a Fourier transform infrared spectrometer for real time applications" Review of Scientific Instruments, 64, 2153-2159, 1993.
8. E. Garcia-Caurel, E. Bertran, and A. Canillas. "Optimized calibration method for Fourier transform infrared phase-modulated ellipsometry", Thin Solid Films, 354, 187-194, 1999.
9. NKD Software: http://www.ub.edu/optmat
10. R. Brendel and D. Bormann, "An infrared dielectric function model for amorphous solids", Journal of Applied Physics, 71, 1-6, 1992.
11. T. Balz, R. Brendel, i R. Hezel, "Plasma-deposited silicon nitride on ultrathin silicon oxide films investigated by infrared grazing internal reflection spectroscopy", Journal of Applied Physics, 76, 4811-4816, 1994.
12. A. Röseler. Infrared spectroscopic ellipsometry, Akademie-Verlag, Berlin, 1990.