Influence of the bias voltage on the structure and the tribological performance of nanoscale multilayer C/Cr PVD coatings

Thin Solid Films

Volumn 475, Issue 1-2 SPEC. ISS., 2005, Pages 219-226

  Kok, Y N ^a   Hovsepian, P Eh ^a   Luo, Q ^a   Lewis, D B ^a   Wen, J G ^b   Petrov, I ^b  

^a SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

^b UNIVERSITY OF ILLINOIS AT URBANA CHAMPAIGN   (United States)

Author keywords

Bias voltage; C Cr coating; Microstructure; Sputtering; Tribology

Indexed keywords

ANNEALING; CHROMIUM COMPOUNDS; COATINGS; DEPOSITION; ELASTIC MODULI; ELECTRIC POTENTIAL; FRICTION; MAGNETRON SPUTTERING; MICROSTRUCTURE; NANOSTRUCTURED MATERIALS; PHYSICAL VAPOR DEPOSITION; SOLID LUBRICANTS; TITANIUM COMPOUNDS; TRANSMISSION ELECTRON MICROSCOPY; TRIBOLOGY; X RAY DIFFRACTION ANALYSIS;

BIAS VOLTAGES; C/CR COATING; NANOSCALE MULTILAYERS; PHYSICAL VAPOR DEPOSITION COATINGS;

MULTILAYERS;

EID: 13444254248     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2004.08.042     Document Type: Conference Paper

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