Development of thin-film total-reflection mirrors for the XUV FEL

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4500, Issue , 2001, Pages 187-192

  Jacobi, S ^a   Wiesmann, J ^a   Steeg, B ^b   Feldhaus, J ^b   Michaelsen, C ^a  

^a INSTITUTE OF MATERIALS RESEARCH   (Germany)

^b DESY   (Germany)

Author keywords

Carbon; FEL (free electron laser); Heat resistance; Magnetron sputtering; Mirror; Soft X rays; Total reflection; X ray optics; XRR (X ray reflectometry)

Indexed keywords

LASER PULSES; LIGHT ABSORPTION; LIGHT REFLECTION; MIRRORS; OPTICAL COATINGS; PHOTONS; RADIATION DAMAGE; REFLECTOMETERS; SPUTTER DEPOSITION; SUBSTRATES; THIN FILMS; X RAY OPTICS;

CARBON FILMS; PHOTON ENERGIES; SILICON SUBSTRATES; SOFT X RAY REFLECTOMETER; TOTAL REFLECTION X RAY MIRRORS;

FREE ELECTRON LASERS;

EID: 0035767650     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.452974     Document Type: Article

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