Surface and interface state analysis of the TPD/Alq 3 using X-ray photoelectron spectroscopy (XPS) and atomic force microscopy (AFM)

Applied Surface Science

Volumn 225, Issue 1-4, 2004, Pages 162-169

  Li, Hairong ^a   Zhang, Fujia ^a   Liu, Su ^a  

^a LANZHOU UNIVERSITY   (China)

Author keywords

Atomic force microscopy; TPD Alq 3; X ray photoelectron spectroscopy

Indexed keywords

ALUMINUM COMPOUNDS; ATOMIC FORCE MICROSCOPY; BINDING ENERGY; CHEMICAL BONDS; GAS ABSORPTION; IONS; MORPHOLOGY; SPUTTERING; THIN FILMS; X RAY PHOTOELECTRON SPECTROSCOPY;

ORGANIC LIGHT EMITTING DEVICES (OLED); TPD/ALQ3;

ORGANIC COMPOUNDS;

EID: 1342329656     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.09.044     Document Type: Article

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