Role of surface instabilities in mixing and oxidation mechanisms of bilayered Y/Zr films at elevated temperature

Applied Surface Science

Volumn 225, Issue 1-4, 2004, Pages 272-280

  Pranevicius, L ^a   Milcius, D ^b   Pranevicius, L L ^a,b   Templier, C ^c   Sirvinskaite, V ^a   Knizikevicius, R ^d  

^a VYTAUTAS MAGNUS UNIVERSITY   (Lithuania)

^b LITHUANIAN ENERGY INSTITUTE   (Lithuania)

^c UNIVERSITÉ DE POITIERS   (France)

^d KAUNAS UNIVERSITY OF TECHNOLOGY   (Lithuania)

Author keywords

Mechanisms; Mixing; Oxidation; Y Zr bilayers; YSZ films

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; FLUXES; IRRADIATION; MECHANISMS; MIXING; OXIDATION; SCANNING ELECTRON MICROSCOPY; SECONDARY ION MASS SPECTROMETRY; SEMICONDUCTING FILMS; SILICON; SUBSTRATES;

Y/ZR BILAYERS; YSZ FILMS;

YTTRIUM;

EID: 1342265793     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2003.10.011     Document Type: Article

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