Electron beam lithography of isolated trenches with chemically amplified positive resist

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 4688, Issue 2, 2002, Pages 878-887

  Eckert, Andrew ^a   Bojko, Rick ^a   Gentile, Harold ^a   Harris, Robert ^a   Jayashankar, Jay ^a   Johns, Earl ^a   Minor, Kevin ^a   Mountfield, Keith ^a   Seiler, Carl ^a   Yang, XiaoMin ^a  

^a SEAGATE RESEARCH   (United States)

Author keywords

E beam; Electron back scattering; FIB; PEB delay; Plating; SEM

Indexed keywords

ASPECT RATIO; BACKSCATTERING; COMPUTER AIDED DESIGN; COMPUTER SOFTWARE; ELECTRON BEAMS; SCANNING ELECTRON MICROSCOPY; THIN FILM DEVICES;

PHOTOCLUSTER TOOLS;

ELECTRON BEAM LITHOGRAPHY;

EID: 18544364227     PISSN: 0277786X     EISSN: None     Source Type: Journal    
DOI: 10.1117/12.472361     Document Type: Article

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