Fabrication of autocloned photonic crystals by using high-density-plasma chemical vapor deposition

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3359-3362

  Chen, H L ^a   Lee, H F ^b   Chao, W C ^c   Hsieh, C I ^c   Ko, F H ^c   Chu, T C ^b  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

^b NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^c NATIONAL NANO DEVICE LABORATORIES   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ION BOMBARDMENT; PHOTONS; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; REACTIVE ION ETCHING; REFRACTIVE INDEX; SCANNING ELECTRON MICROSCOPY; SILICA; SPUTTERING; THIN FILMS;

AUTOCLONING; HIGH-DENSITY PLASMA (HDP); PHOTONIC BANDS; PHOTONIC CRYSTALS;

CRYSTALS;

EID: 13244272357     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1824059     Document Type: Conference Paper

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