Tailoring of the unit cell structure of autocloned photonic crystals

IEEE Journal of Quantum Electronics

Volumn 38, Issue 7, 2002, Pages 899-903

  Kawashima, Takayuki ^b   Sato, Takashi ^b   Ohtera, Yasuo ^b   Kawakami, Shojiro ^a,b,c  

^a IEEE

^b TOHOKU UNIVERSITY   (Japan)

^c JAPAN SCIENCE AND TECHNOLOGY AGENCY   (Japan)

Author keywords

Fabrication; Photonic crystal; Reactive ion etching

Indexed keywords

CRYSTAL STRUCTURE; CRYSTALS; ENERGY GAP; MULTILAYERS; OPTICAL PROPERTIES; PERMITTIVITY; PHOTONS; REACTIVE ION ETCHING; SPUTTERING;

AUTOCLONING METHOD; PHOTONIC BANDS; PHOTONIC CRYSTALS;

OPTICAL MATERIALS;

EID: 0036649615     PISSN: 00189197     EISSN: None     Source Type: Journal    
DOI: 10.1109/JQE.2002.1017604     Document Type: Article

References (16)

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11. 2
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13. Mechanism of shape-formation of 3D periodic nanostructures by bias sputtering
14. Band engineering of photonic crystals: Realization of novel waveguides
15. Application of in-plane type autocloned photonic crystals
16. Drilled alternating-layer three-dimensional photonic crystals having a full band gap