Effect of fluoroalkyl substituents on the reactions of alkylchlorosilanes with mold surfaces for nanoimprint lithography

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 22, Issue 6, 2004, Pages 3233-3241

  Chen, Jem Kun ^a   Ko, Fu Hsiang ^a   Hsieh, Kuen Fong ^b   Chou, Cheng Tung ^b   Chang, Feng Chih ^a  

^a NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

^b NATIONAL CENTRAL UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ADHESION; ANNEALING; CONTACT ANGLE; DEFECTS; INTERFACIAL ENERGY; MOLDS; NANOTECHNOLOGY; ORGANIC ACIDS; PLASMAS; REACTION KINETICS; SCANNING ELECTRON MICROSCOPY; SELF ASSEMBLY; SILICON; SURFACE ROUGHNESS; THIN FILMS; VAN DER WAALS FORCES;

ALKYLCHLOROSILANCES; MOLD SURFACES; NANOIMPRINT LITHOGRAPHY; SELF-ASSEMBLED FILMS;

CHLORINE COMPOUNDS;

EID: 13244261150     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1815305     Document Type: Conference Paper

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