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Volumn 35, Issue 12, 1999, Pages 1024-1025

Smart-Cut process using metallic bonding: Application to transfer of Si, GaAs, InP thin films

Author keywords

[No Author keywords available]

Indexed keywords

BONDING; SEMICONDUCTING GALLIUM ARSENIDE; SEMICONDUCTING INDIUM PHOSPHIDE; SEMICONDUCTOR DEVICE STRUCTURES; SILICON WAFERS; SUBSTRATES;

EID: 13044254778     PISSN: 00135194     EISSN: None     Source Type: Journal    
DOI: 10.1049/el:19990663     Document Type: Article
Times cited : (36)

References (7)
  • 1
    • 0029637854 scopus 로고
    • Silicon on insulator material technology
    • BRUEL, M.: 'Silicon on insulator material technology', Electron. Lett., 1995, 31, (14), pp. 1201-1202
    • (1995) Electron. Lett. , vol.31 , Issue.14 , pp. 1201-1202
    • Bruel, M.1
  • 2
    • 0032545852 scopus 로고    scopus 로고
    • Transfer of 3in GaAs film on silicon substrate by proton implantation process
    • JALAGUIER, E., ASPAR, B., POCAS, S., MICHAUD, J.F., ZUSSY, M., and BRUEL, M.: 'Transfer of 3in GaAs film on silicon substrate by proton implantation process', Electron. Lett., 1998, 34, (4), pp. 408-409
    • (1998) Electron. Lett. , vol.34 , Issue.4 , pp. 408-409
    • Jalaguier, E.1    Aspar, B.2    Pocas, S.3    Michaud, J.F.4    Zussy, M.5    Bruel, M.6
  • 5
    • 0024072531 scopus 로고
    • An investigation of a non-spiking Ohmic contact to n-GaAs using the Si/Pd system
    • WANG, L.C., ZHANG, B., FANG, F., MARSHALL, E.D., LAU, S.S., SANDS, T., and KUECH, T.F.: 'An investigation of a non-spiking Ohmic contact to n-GaAs using the Si/Pd system', J. Mater. Res., 1988, 3, (5), pp. 922-930
    • (1988) J. Mater. Res. , vol.3 , Issue.5 , pp. 922-930
    • Wang, L.C.1    Zhang, B.2    Fang, F.3    Marshall, E.D.4    Lau, S.S.5    Sands, T.6    Kuech, T.F.7


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.