Electrocoagulation for removal of silica nano-particles from chemical-mechanical-planarization wastewater

Colloids and Surfaces A: Physicochemical and Engineering Aspects

Volumn 254, Issue 1-3, 2005, Pages 81-89

  Den, Walter ^a   Huang, Chihpin ^b  

^a TUNGHAI UNIVERSITY   (Taiwan)

^b NATIONAL CHIAO TUNG UNIVERSITY   (Taiwan)

Author keywords

Chemical mechanical planarization; CMP wastewater treatment; Electrochemical; Electrocoagulation; Monopolar; Parallel plate; Silica colloids

Indexed keywords

ELEMENTARY PARTICLES; HYDRAULICS; NANOSTRUCTURED MATERIALS; NETWORKS (CIRCUITS); PARAMETER ESTIMATION; TURBIDITY; WASTEWATER;

CHEMICAL-MECHANICAL-PLANARIZATION (CMP); DESIGN PARAMETERS; ELECTROCOAGULATION; SILICA PARTICLES;

SILICA;

ALUMINUM DERIVATIVE; NANOPARTICLE; SILICON DIOXIDE;

AQUEOUS SOLUTION; ARTICLE; DENSITY; ELECTRIC FIELD; ELECTROCOAGULATION; ELECTRODE; ELECTROPHORESIS; LINEAR SYSTEM; PARTICULATE MATTER; PRIORITY JOURNAL; SLUDGE; TURBIDITY; WASTE WATER MANAGEMENT;

EID: 12844283955     PISSN: 09277757     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.colsurfa.2004.11.026     Document Type: Article

References (19)

1. M.S. Kim, S.W. Woo, and J.G. Park Jpn. J. Appl. Phys. 41 2002 6342
2. B. Maag, D. Boning, and B. Voelker Semicond. Int. 23 2000 101
3. SEMATECH International, International Technology Roapmap for Semiconductors, SEMATECH, Austin, TX, 2001.
4. J.H. Golden, R. Small, L. Pagan, C. Chang, and S. Ragavan Semicond. Int. 23 2000 85
5. J.H. Golden, and J.E. Carrubba Semicond. Fabtech. 13 2001 123
6. S. Browne, V. Krygier, J. O' Sullivan, and E.L. Sandstrom MICRO 17 1999 77
7. W. Jiang, C. Huang, and H. Wu Proceedings of the International Water Association Asia Environmental Technology Conference Suntech City, Singapore, 30 October-1 November 2001
8. R. Woodling Semicond. Fabtech. 14 2001 69
9. G.C.C. Yang, T.-Y. Yang, and S.-H. Tsai Water Res. 37 2003 784
10. B.M. Belongia, P.D. Haworth, J.C. Baygents, and S. Raghavan J. Electrochem. Soc. 146 1999 4124
11. C. Tsouris, D.W. DePaoli, J.T. Shor, Z.-C. Hu, and T.-Y. Ying Colloids Surf. A 177 2001 223
12. C.L. Lai, and S.H. Lin Chem. Eng. J. 95 2003 205
13. M.J. Matteson, R.L. Dobson, R.W. Glenn, N.S. Kukunoor, W.H. Waits, and E.J. Clayfield Colloids Surf. A 104 1995 101
14. W. Den, C. Huang, and S.-S. Chiou Proceedings of the Ninth International Semiconductor Environmental Health and Safety Conference (ISESH) San Diego, California, 9-13 June 2002
15. C. Kan, C. Huang, and J.R. Pan Colloids Surf. A 203 2002 1
16. G. Chen, X. Chen, and P.L. Yue Chem. Eng. Sci. 57 2002 2449
17. P.C. Hiemenz, and R. Rajagopalan Principles of Colloid and Surface Chemistry third ed. 1997 Marcel Dekker New York
18. J. Dziewinski, S. Marczak, E. Nuttall, G. Purdy, W. Smith, J. Taylor, and C. Zhou Waste Manage. 18 1998 257
19. R.D. Latterman R.D. Latterman A. Amirtharajah C.R. O'Melia Water Quality and Treatment 1999 McGraw-Hill New York