Scanning near-field microwave probe for in-line metrology of low-k dielectrics

Materials Research Society Symposium Proceedings

Volumn 812, Issue , 2004, Pages 73-78

  Talanov, Vladimir V ^a   Moreland, Robert L ^a   Scherz, André ^a   Schwartz, Andrew R ^a   Liu, Youfan ^b  

^a Neocera Inc   (United States)

^b INTEL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ALUMINUM; CHEMICAL VAPOR DEPOSITION; ION BEAMS; LIGHT REFLECTION; MAGNETIC PERMEABILITY; MEASUREMENT THEORY; MERCURY (METAL); MICROWAVES; PERMITTIVITY; PROBES; QUARTZ; SCANNING; SIMULATORS; THIN FILMS;

FOCUSED ION BEAM (FIB) TECHNIQUE; QUALITY FACTOR (Q); STANDARD DEVIATIONS; VACUUM PERMEABILITY;

DIELECTRIC MATERIALS;

EID: 12844282847     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-812-f5.11     Document Type: Conference Paper

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