Electron-optics method for high-throughput in a SCALPEL system: Preliminary analysis

Microelectronic Engineering

Volumn 41-42, Issue , 1998, Pages 215-218

  Waskiewicz, W K ^a   Harriott, L R ^a   Liddle, J A ^a   Stanton, S T ^a   Berger, S D ^b   Munro, E ^c   Zhu, X ^c  

^a LUCENT TECHNOLOGIES   (United States)

^b Integrated Solutions Inc   (United States)

^c Munro's Electron Beam Software Ltd   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BEAMS; INTEGRATED CIRCUITS; OPTICS; SEMICONDUCTOR DEVICE MANUFACTURE;

ELECTRON-OPTICS METHOD; SCALPEL SYSTEM;

LITHOGRAPHY;

EID: 12844271833     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0167-9317(98)00049-5     Document Type: Article

References (5)

1. W. K. Waskiewicz, et al., Proc. SPIE, 3048, 255 (1997); L. R. Harriott, et al., Microelect. Eng., 35, 477 (1997).
2. W. K. Waskiewicz, et al., Proc. SPIE, 3048, 255 (1997); L. R. Harriott, et al., Microelect. Eng., 35, 477 (1997).
3. Wolfram Research Inc., Champaign, Illinios, 61802, USA.
4. J. A. Liddle, et al, Microelect. Eng., these proceedings.
5. X. Zhu, H. Liu, E. Munro, and J. Rouse, Proc. SPIE, 3155, 47 (1997).