Performance analysis of a-Si:H detectors deposited on CMOS chips

Materials Research Society Symposium Proceedings

Volumn 808, Issue , 2004, Pages 513-518

  Miazza, C ^a   Dunand, S ^a   Wyrsch, N ^a   Shah, A ^a   Blanc, N ^b   Kaufmann, R ^b   Cavalier, L ^b  

^a Bâtiment G   (Switzerland)

^b CSEM   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; CURRENT DENSITY; INTEGRATION; PHOTODIODES; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; SENSORS; THIN FILMS;

INTEGRATION LEVEL; READOUT CHIPS; SILICON DETECTORS; VERY HIGH FREQUENCY (VHF);

AMORPHOUS SILICON;

EID: 12844268713     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-808-a4.46     Document Type: Conference Paper

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