Development of Vertically Integrated Imaging and Particle Sensors

Materials Research Society Symposium - Proceedings

Volumn 762, Issue , 2003, Pages 205-210

  Wyrsch, N ^a   Miazza, C ^a   Dunand, S ^a   Shah, A ^a   Blanc, N ^b   Kaufmann, R ^b   Cavalier, L ^b   Anelli, G ^c   Despeisse, M ^c   Jarron, P ^c   Moraes, D ^c   Sirvent, A G ^c   Dissertori, G ^d   Viertel, G ^d  

^a Institut de Microtechnique   (Switzerland)

^b CSEM   (Switzerland)

^c CERN   (Switzerland)

^d ETH ZURICH   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS SILICON; APPLICATION SPECIFIC INTEGRATED CIRCUITS; CMOS INTEGRATED CIRCUITS; CROSSTALK; ELECTRIC CURRENTS; ELECTRON MOBILITY; GLASS; HIGH ENERGY PHYSICS; HYDROGENATION; IMAGING SYSTEMS; PARTICLE DETECTORS; PHOTODIODES; PHOTOLITHOGRAPHY; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; QUANTUM EFFICIENCY; THIN FILMS;

ACTIVE PIXEL SENSORS (APS); BETA PARTICLES; BIAS VOLTAGE;

IMAGE SENSORS;

EID: 1642479959     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-762-a18.14     Document Type: Conference Paper

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