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Volumn 38, Issue 2, 2005, Pages 319-327

SiGe/Si layers-early stages of plastic relaxation

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; CHEMICAL VAPOR DEPOSITION; COMPUTER SIMULATION; DISLOCATIONS (CRYSTALS); NUCLEATION; PROBABILITY; SILICON WAFERS; TRANSMISSION ELECTRON MICROSCOPY;

EID: 12844260749     PISSN: 00223727     EISSN: None     Source Type: Journal    
DOI: 10.1088/0022-3727/38/2/017     Document Type: Conference Paper
Times cited : (4)

References (21)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.