Voltage-current characteristics of nitrogen high-current glow discharge

Journal of Advanced Oxidation Technologies

Volumn 8, Issue 1, 2005, Pages 11-17

  Takaki, K ^a   Hosokawa, M ^a   Sasaki, T ^a   Mukaigawa, S ^a   Fujiwara, T ^a  

^a IWATE UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODES; CHEMICAL ANALYSIS; GLOW DISCHARGES; MOLECULES; NITROGEN;

EXPERIMENTAL CONDITIONS; GLOW DISCHARGE CURRENT; GLOW DISCHARGE VOLTAGE; LOW INDUCTANCE CAPACITORS; METASTABLE MOLECULES; NITROGEN GLOW DISCHARGE; V-I CHARACTERISTIC; VOLTAGE-CURRENT CHARACTERISTICS;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 12444306343     PISSN: 12038407     EISSN: None     Source Type: Journal    
DOI: 10.1515/jaots-2005-0102     Document Type: Conference Paper

References (33)

1. Czerwiec, T.; Renevier, N.; Michel, H. Surf. Coat. Technol. 2000, 737, 267-277.
2. Jeong, B.-Y.; Kim, M.-R Surf. Coat. Technol. 2001, 137, 249-254.
3. Tang, B. Y.; Chu, P. K.; Wang S. Y.; Chow K. W.; Wang X. F. Surf. Coat. Technol. 1998, 103-104, 248-251.
4. Chen, J. S.; Lau, S. P; Sun, Z.; Tay, B. K.; Yu G., O.; Zhu, F. Y; Zhu, D. Z.; Xu, H. J. Surf. Coat. Technol. 2001, 138, 33-38.
5. Denes, L. J.; Lowke, J. J. Appl. Phys. Lett. 1973, 23, 130-132.
6. Park, S-J.; Wagner, C. J.; Herring, C. M.; Eden, J. G. Appl. Phys. Lett. 2000, 77, 199-201.
7. Park, J.; Henins, I.; Hermann, H. W.; Selwyn, G. S.; Jeong, J. Y.; Hicks, R. F.; Shim, D.; Chang, C. S. Appl. Phys. Lett. 2000, 76, 288-290.
8. Schoenbach, K. H.; El-Habachi, A.; Shi W.; Ciocca, M. Plasma Sources Sci. Thchnol. 1997, 6, 468-477.
9. Barankova, H.; Bardos, L. Appl. Phys. Lett. 2000, 76, 285-287.
10. Okazaki, S.; Kogoma, M.; Uehara, M.; Kimura, Y. J. Phys. D: Appl. Phys. 1993, 26, 889-892.
11. Takechi, S.; Sugimoto, S.; Kiuchi, M.; Tanaka, K.; Coto, S. Surf. Coat. Technol. 2001, 736, 69-72.
12. Takaki, K.; Kitamura, D.; Fujiwara, T. J. Phys. D: Appl. Phys. 2000, 33, 1369-1375.
13. Takaki, K.; Taguchi, D.; Fujiwara, T. App. Phys. Lett. 2001, 78(18), 2646-2648.
14. Takaki, K.; Koseki, D.; Fujiwara, T. Surf. Coat. Technol. 2001, 136, 261-264.
15. Korolev, Yu. D; Mesyats G. A. Physics of Pulsed Breakdown in Gases; URO-Press: Urals, 1998; p 2.
16. Cavenor, M.; Meyer, J. Aust. J. Phys. 1969, 22, 155-167.
17. Gambling, W.; Edelse, H. Brit. J. Appl. Phys. 1954, 5, 36-39.
18. Meyer, J.; Lee, C. J. Phys. D: Appl. Phys. 1971, 4, 168-170.
19. Asami, Y.; Dote, T.; Suginuma, Y., Eds. Houden Handbook, Corona Co. Tokyo, 1974; p 110. [in Japanese]
20. Huxley, L. G. H.; Crompton, R. W., Eds. The Diffusion and Drift of Electrons in Gases; John Wiley & Son: New York, 1974.
21. Nakamura, Y. J. Phys. D: Appl. Phys. 1987, 20, 933-938.
22. Kossyi, I. A.; Kostinsky, A. Yu; Matveyev, A. A.; Silakov, V. P. Plasma Sources Sci. Technol. 1992, 1, 207.
23. Ichikawa, Y.; Hayashi, M.; Ichimura, A.; Onda, K.; Sakimoto, K.; Takayamnagi, K.; Nakamura, M.; Nishimura, H.; Takayanagi, T. J. Phys. Chem. Ref. Data 1986, 75, 985-1009.
24. Crowe, A.; McConkey, J. W. Atom. Molec. Phys. 1973, 6, 2108-2117.
25. Bacri, J.; Medani, A. Physica 1982, 112C, 101-118.
26. Rapp, D.; Englander-Golden, P. J. Chem. Phys. 1965, 43, 1464-1479.
27. Chang, J. S.; Kwan, A. In Modelling of Dry Air Chemistry in a Coaxial Wire-Pipe Negative Corona Discharge; ESA-IEJ Joint Symp. on Electrostatics Proceeding; Laplacian Press: Morgan Hill Co., 1998, pp 390-408.
28. Beuthe, T. G.,; Chang, J. S. In Handbook of Electrostatics Processes; Kelly, A. J.; Crowley, J. M. Eds, New York: Marcel Dekker, Inc.: 1995, p 172.
29. Takaki, K.; Chang, J.S.; Kostov, K. G. IEEE Trans. Diel. Elect. Insul. (in press).
30. Ono, S.; Teii, S. J. Phys. D: Appl. Phys. 1984, 17, 1999-2008.
31. Gordiets, B.F.; Ferreira, C.M.; Guerra, V.L.; Loureiro, M.A.H.; Nahorny, J.; Pagnon, D.; Touzeau, M.; Vialle, M. IEEE Trans. Plasma Sci. 1995, 23, 750-767.
32. Guerra, V.; Loureiro, J. Plasma Sources Sci. Thecnol. 1997, 6, 361-372.
33. Matsuda, S.; Shimosato, H.; Yumoto, M.; Sakai, T. IEEJ. Trans. FM. 2003, 123-A, 167-172.