Voltage-current characteristics of high-current glow discharges

Applied Physics Letters

Volumn 78, Issue 18, 2001, Pages 2646-2648

  Takaki, K ^a   Taguchi, D ^a   Fujiwara, T ^a  

^a IWATE UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0035971685     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1369612     Document Type: Article

References (12)

1. L. J. Denes and J. J. Lowke, Appl. Phys. Lett. 23, 130 (1973).
2. S.-J. Park, C. J. Wagner, C. M. Herring, and J. G. Eden, Appl. Phys. Lett. 77, 199 (2000).
3. J. Park, I. Henins, H. W. Hermann, G. S. Selwyn, J. Y. Jeong, R. F. Hicks, D. Shim, and C. S. Chang, Appl. Phys. Lett. 76, 288 (2000).
4. K. H. Schoenbach, A. El-Habachi, W. Shi, and M. Ciocca, Plasma Sources Sci. Technol. 6, 468 (1997).
5. H. Barankova and L. Bardos, Appl. Phys. Lett. 76, 285 (2000).
6. S. Takechi, S. Sugimoto, M. Kichi, K. Taaka, and S. Goto, in Proceedings of the Fifth International Workshop on Plasma-Based Ion Implantation, Kyoto, Japan, 13-16 December 1999, p. 17.
7. K. Takaki, D. Kitamura, and T. Fujiwara, J. Phys. D 33, 1369 (2000).
8. H. Akiyama, M. Kristiansen, H. Krompholz, and B. Mass, IEEE Trans. Plasma Sci. 16, 312 (1988).
9. K. Takaki, A. Takahashi, and T. Fujiwara, J. Phys. D 33, 3060 (2000).
10. Y. Asami, T. Dote, and Y. Suginuma, Houden Handbook (Corona Co., Tokyo, 1974). p. 110 (in Japanese).
11. M. Cavenor and J. Meyer, Aust. J. Phys. 22, 155 (1969).
12. S. Takeda, Kitai Houden no Kiso (Tokyo Denki, Tokyo, 1990), p. 35 (in Japanese).